Facilities

DONHEE HAM LAB FACILITIES

Our laboratory, located in Maxwell Dworkin Laboratory, is equipped with facilities for radio-frequency and microwave measurements, THz spectroscopy with femtosecond laser, and optical spectroscopy for experimentation with various solid-state devices and circuits at room as well as cryogenic temperatures, and facilities for cell biology, electrophysiology, electrochemistry, and fluorescence imaging. Specifically:

(1) Cascade Microtech RF/microwave (~110 GHz) probe station with an Nd:Yag laser for metal trimming and a micro chamber for EMI shielding;
(2) Lakeshore cryogenic (~ 1.5 Kelvin) RF/microwave (~67 GHz) probe station;
(3) Nikon LV 150 reflected light microscope;
(4) Oxford Instrument 3T superconducting magnet;
(3) Ti:sapphire femtosecond laser;
(4) Time-domain THz spectroscopy system (0.3~10 THz);
(5) Agilent spectrum analyzers with a built-in phase noise measurement capability (50 GHz);
(6) Two Agilent vector network analyzers (50 GHz, 9 GHz);
(7) Agilent CW signal generators (50 GHz);
(8) Agilent digital communication analyzer (80 GHz electrical, 40 GHz optical);
(9) Agilent real-time oscilloscope (6 GHz; 20 Gs/sec);
(10) HP real-time oscilloscope (500 MHz; 1 Gs/sec);
(11) Tektronix real-time oscilloscope (200 MHz, 2 Gs/s);
(12) Agilent function generator (120 MHz);
(13) Agilent logic analyzer;
(14) Two Stanford Research lock-in amplifiers;
(15) Agilent high-precision power supply;
(16) AES temperature chamber (-65°C~200°C);
(17) Westbond wire bonder; chip assembly & packaging facilities;
(18) Chemical vapor deposition setup for graphene and carbon nanotube growth;
(19) Semiconductor integrated circuits design EDA (Cadence, ADS, and Hspice);
(20) Electromagnetic Field solvers (HFSS, Sonnet, Maxwell);
(21) Cell culture and biology facilities;
(22) Electrophysiology capabilities;
(23) Electrochemistry capabilities;
(24) High-end microwave cables, adapters, connectors, on-chip probes, and numerous general purpose power supplies and multimeters.


HARVARD CENTER FOR NANOSCALE SYSTEMS SHARED FACILITIES

Harvard University's CNS houses, in 85,000-ft2 Laboratory for Integrated Science and Engineering (LISE), shared nano fabrication and characterization facilities, maintained by technical staff supported by Harvard. This is a major investment by Harvard to promote interdisciplinary research on small structures in areas including Electrical Engineering, Applied Physics, Biology, and Chemistry. CNS facilities include: 1) clean rooms for soft lithography and for optical & e-beam lithography equipped with e-beam lithography systems. Clean room facilities also include etching, deposition, and other aspects of nanofabrication, 2) imaging laboratory that includes SEMs, STEM, & TEM, and 3) advanced materials synthesis and processing equipment.